The $5,000 SPIE-BACUS Scholarship is awarded to a full-time undergraduate or graduate student in the field of microlithography with an emphasis on photomask technology and/or optical/EUV photolithography technologies. This scholarship is sponsored by BACUS, the International Technical Group of SPIE dedicated to the advancement of photomask technology.
The funding can be used to support tuition and fees, textbooks, supplies and equipment required by your institution for courses of instruction, and a computer or computer upgrade that is required by your institution for course of study.
All applicants must meet the following requirements in order for the application to be forwarded for consideration:
- Must be Student Member of SPIE
- Must be a student studying microlithography or a related field.
- Two (2) recommendations are required and must be received before 5:00 pm (Pacific Standard Time) on May 31. Family members, relatives and students are not eligible to submit a recommendation.
- Recommendations must be completed using the online application system. Letters sent as email attachments will not be accepted.
- If applicable, your annual scholarship report must be on file with SPIE if you have received a previous scholarship(s).
- Applicants who have received a terminal degree (MD, JD, PhD, etc.) are not eligible to apply.
- Incomplete applications will be removed from consideration.
To Apply
Please login using your SPIE credentials, and then apply by clicking the blue button that appears above. If you have forgotten your account information, please open this link and click "Forgot Username" and/or "Forgot Password" or contact scholarships@spie.org should you have any questions.
2024 SPIE-BACUS Scholarship
The $5,000 SPIE-BACUS Scholarship is awarded to a full-time undergraduate or graduate student in the field of microlithography with an emphasis on photomask technology and/or optical/EUV photolithography technologies. This scholarship is sponsored by BACUS, the International Technical Group of SPIE dedicated to the advancement of photomask technology.
The funding can be used to support tuition and fees, textbooks, supplies and equipment required by your institution for courses of instruction, and a computer or computer upgrade that is required by your institution for course of study.
All applicants must meet the following requirements in order for the application to be forwarded for consideration:
- Must be Student Member of SPIE
- Must be a student studying microlithography or a related field.
- Two (2) recommendations are required and must be received before 5:00 pm (Pacific Standard Time) on May 31. Family members, relatives and students are not eligible to submit a recommendation.
- Recommendations must be completed using the online application system. Letters sent as email attachments will not be accepted.
- If applicable, your annual scholarship report must be on file with SPIE if you have received a previous scholarship(s).
- Applicants who have received a terminal degree (MD, JD, PhD, etc.) are not eligible to apply.
- Incomplete applications will be removed from consideration.
To Apply
Please login using your SPIE credentials, and then apply by clicking the blue button that appears above. If you have forgotten your account information, please open this link and click "Forgot Username" and/or "Forgot Password" or contact scholarships@spie.org should you have any questions.